Thin films are widely used in a variety of applications and the Thin-Film Measurement System can easily determine their properties. Based on interference spectral analysis of multi-reflection beams, this instrument functions non-contact optical measurement of thickness, refractive index, and extinction coefficient of various thin films and coatings.
With dedicated hardware design and program development, this measurement system is easy to setup and the software is user friendly. It is suitable for both on-line manufacturing and desktop measuring.
With the ability to connect to your microscope to reduce the spot size or to dismantle for solely spectroscopic use, the Thin-Film Measurement System really is your solution to your measurement problems.
- Fast Measurement
- Multi-layers
- User friendly
- Flexibility
- Cost effective
Description
- Thickness only: 20nm to 50µm
- Thickness with n and k: 100nm to 10µm
- Wavelength Range: 360nm to 1000nm
- 360nm to 1000nm: The greater of ±1nm or ±0.5%
- Precision: 0.2nm
- Repeatability: 0.1nm
- Spot size: Adjustable 0.8mm to 1cm (10µm with a microscope)
- Sample size: From 1mm and up
- Layers: Up to 4 layers
- Detector type: 2048-element linear silicon CCD array
- Light source: Tungsten Halogen
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spectral and optical systems 
